Elite Group of Risk Management Professionals to be Recognized
NEW YORK (July 7, 2015)
, the risk management society™, will welcome author and award-winning professor Witold J. Henisz
to keynote RIMS ERM Conference 2015
scheduled for October 26 – 27 in Chicago. Dr. Henisz’s remarks will address the advantages ERM lends to risk professionals who are faced with the daunting task of protecting and enhancing corporate reputation to strengthen relationships with key external stakeholders.
Professor Henisz will kick-off two days of exchanging ideas, practices and solutions designed to advance risk management professionalism through ERM. New to this year’s conference, a select group of organizations and risk professionals - who are reaching more mature risk management levels - will be recognized during the ERM Leaders Recognition Luncheon & Solutions Showcase
. RIMS will award its highest recognition – the ERM Award of Distinction
– during the luncheon.
“With so many factors influencing how organizations successfully manage their reputations in a globalized world, many risk professionals are addressing this board-level priority through their enterprise risk management programs,” said RIMS Director of Strategic and Enterprise Risk Management Practice Carol Fox. “With a balanced background in academia, consultancy, and having conducted extensive research on the subject of corporate diplomacy, Professor Henisz brings a worldly perspective to the ERM Conference – a perfect complement to our lineup of highly accomplished risk management leaders.”
Withold J. Henisz
is the Deloitte & Touche Professor of Management in Honor of Russell E. Palmer at The University of Pennsylvania Wharton School of Business. Author of the book Corporate Diplomacy: Building Reputations and Relationships with External Stakeholders Henisz’s research published in several top-ranked journals also examines the impact of political hazards on international investment strategy. He is currently a principal in the political risk management consultancy PRIMA LLC.